553468
Tris(tert-butoxy)silanol
99.999%
Manufacturer: Sigma Aldrich
CAS Number: 18166-43-3
Synonym(S): TBS
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 5 G | 553468-5-G | In Stock | ₹ 9,915.70 |
| 25 G | 553468-25-G | In Stock | ₹ 26,694.45 |
553468 - 5 G
In Stock
Quantity
1
Base Price: ₹ 9,915.70
GST (18%): ₹ 1,784.826
Total Price: ₹ 11,700.526
Quality Level
100
Assay
99.999%
form
solid
bp
205-210 °C (lit.)
mp
63-65 °C (lit.)
SMILES string
CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
InChI
1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
InChI key
HLDBBQREZCVBMA-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Sigma Aldrich Fine Chemicals Biosciences Tris(tert-butoxy)silanol 99.999% | 18166-43-3 | MFCD00271024 | 25G | -- | ₹ 44,456.98 | |
| | Tri-t-butoxysilanol | -- | ₹ 1,77,280.32 | |
| | 18166-43-3 | SILICIC ACID (H4SIO4), TRIS(1,1-DIMETHYLETHYL) ESTER | -- | ₹ 5,732.52 - ₹ 11,122.80 |
Related Products
Description
- General description: Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.[1]
- Application: Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films.[1] Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.[2][3]
SAFETY INFORMATION
WGK
WGK 3
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves