666610
Tetrakis(dimethylamido)hafnium(IV)
packaged for use in deposition systems
Manufacturer: Sigma Aldrich
CAS Number: 19782-68-4
Synonym(S): TDMAH, Tetrakis(dimethylamino)hafnium(IV)
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 25 G | 666610-25-G | In Stock | ₹ 1,40,876.55 |
666610 - 25 G
In Stock
Quantity
1
Base Price: ₹ 1,40,876.55
GST (18%): ₹ 25,357.779
Total Price: ₹ 1,66,234.329
Quality Level
100
Assay
≥99.99% (trace metals analysis)
form
low-melting solid
reaction suitability
core: hafnium
mp
26-29 °C (lit.)
density
1.098 g/mL at 25 °C
SMILES string
CN(C)[Hf](N(C)C)(N(C)C)N(C)C
InChI
1S/4C2H6N.Hf/c4*1-3-2;/h4*1-2H3;/q4*-1;+4
InChI key
ZYLGGWPMIDHSEZ-UHFFFAOYSA-N
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Strem, An Ascensus Company CAS# 19782-68-4. 1g. Tetrakis(dimethylamino)hafnium, 98+% (99.99+%-Hf, <0.2% Zr) TDMAH, PURATREM. MFCD01862473 | -- | ₹ 13,963.39 | |
| | Tetrakis(dimethylamido)hafnium(IV) | -- | ₹ 94,891.95 | |
| | Methanamine, N-methyl-, hafnium(4+) salt (4:1) | -- | -- | |
| | 19782-68-4 | Methanamine, N-methyl-, hafnium(4+) salt (4:1) | -- | ₹ 15,315.24 - ₹ 99,249.60 |
Related Products
Description
- General description: Alkyl amides of Hafnium provide a convenient and effective atomic layer deposition precursor to smooth and and amorphous hafnium oxide thin films.[1][2][3][4]
- Application: Precursors Packaged for Depositions Systems
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
P210 - P231 + P232 - P280 - P305 + P351 + P338 - P370 + P378 - P402 + P404
Hazard Classifications
Flam. Sol. 1 - Skin Corr. 1B - Water-react 2
Supplementary Hazards
EUH014
WGK
WGK 3
Flash Point(F)
109.4 °F
Flash Point(C)
43 °C
Personal Protective Equipment
dust mask type N95 (US), Eyeshields, Gloves