Tetraethyl orthosilicate
packaged for use in deposition systems
Manufacturer: Sigma Aldrich
CAS Number: 78-10-4
Synonym(S): Tetraethyl orthosilicate, Orthosilicic acid tetraethyl ester, Silicon tetraethoxide, Tetraethoxysilane, Tetraethoxysilicon(IV), Tetraethyl silicate, TEOS
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 25 ML | 759414-25-ML | In Stock | ₹ 50,682.65 |
759414 - 25 ML
In Stock
Quantity
1
Base Price: ₹ 50,682.65
GST (18%): ₹ 9,122.877
Total Price: ₹ 59,805.527
vapor density
7.2 (vs air)
Quality Level
100
vapor pressure
<1 mmHg ( 20 °C)
Assay
≥99.5% (GC)
form
liquid
refractive index
n20/D 1.382 (lit.)
bp
168 °C (lit.)
density
0.933 g/mL at 20 °C (lit.)
SMILES string
CCO[Si](OCC)(OCC)OCC
InChI
1S/C8H20O4Si/c1-5-9-13(10-6-2,11-7-3)12-8-4/h5-8H2,1-4H3
Other Options
| Image | Product Name | Manufacturer | Price Range | |
|---|---|---|---|---|
 | Sigma Aldrich Fine Chemicals Biosciences Tetraethyl orthosilicate >=99.0% (GC) | 78-10-4 | MFCD00009062 | 250ML | -- | ₹ 6,382.78 | |
| | Sigma Aldrich Fine Chemicals Biosciences Tetraethyl orthosilicate reagent grade, 98% | 78-10-4 | MFCD00009062 | 25ML | -- | ₹ 4,534.68 | |
| | Sigma Aldrich Fine Chemicals Biosciences Tetraethyl orthosilicate | 78-10-4 | MFCD00009062 | 500ml | -- | ₹ 5,142.16 | |
| | Sigma Aldrich Fine Chemicals Biosciences Tetraethyl orthosilicate reagent grade | 78-10-4 | MFCD00009062 | 1l | -- | ₹ 7,503.61 | |
| | Tetraethyl orthosilicate | -- | ₹ 2,110.88 - ₹ 14,191.58 | |
| | Tetraethyl orthosilicate | -- | ₹ 8,486.80 - ₹ 19,181.90 | |
| | Tetraethyl orthosilicate | -- | ₹ 2,110.88 - ₹ 14,191.58 | |
| | Tetraethyl orthosilicate | -- | ₹ 4,752.18 - ₹ 12,113.18 | |
| | Tetraethyl orthosilicate | -- | ₹ 8,486.80 - ₹ 19,181.90 | |
| | Tetraethyl orthosilicate | -- | ₹ 10,200.00 - ₹ 1,06,430.00 |
Related Products
Description
- Application: Tetraethyl orthosilicate (TEOS) is an oxygen containing precursor of Si used for the deposition of:Si oxideOxycarbideDoped silicateSilanolSiloxane polymerOrganosilicon thin filmsThe films can be deposited at low temperatues (<250 °C). TEOS is also used to deposit mesoporous and nanoporous thin films of silica. These porous films can be doped during deposition to further enhance their properties.
SAFETY INFORMATION
Pictograms
Signal Word
Warning
Hazard Statements
Precautionary Statements
P210 - P233 - P240 - P241 - P304 + P340 + P312 - P305 + P351 + P338
Hazard Classifications
Acute Tox. 4 Inhalation - Eye Irrit. 2 - Flam. Liq. 3 - STOT SE 3
Target Organs
Respiratory system
WGK
WGK 1
Flash Point(F)
113.0 °F
Flash Point(C)
45 °C