767484
Nickel
sputtering target, diam. × thickness 2.00 in. × 0.25 in., 99.95% trace metals basis
Manufacturer: Sigma Aldrich
CAS Number: 7440-02-0
Select a Size
| Pack Size | SKU | Availability | Price |
|---|---|---|---|
| 1 EA | 767484-1-EA | In Stock | ₹ 25,960.00 |
767484 - 1 EA
In Stock
Quantity
1
Base Price: ₹ 25,960.00
GST (18%): ₹ 4,672.80
Total Price: ₹ 30,632.80
Quality Level
100
Assay
99.95% trace metals basis
form
solid
reaction suitability
core: nickel
resistivity
6.97 μΩ-cm, 20°C
diam. × thickness
2.00 in. × 0.25 in.
bp
2732 °C (lit.)
mp
1453 °C (lit.)
density
8.9 g/mL at 25 °C (lit.)
SMILES string
[Ni]
Other Options
...
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Description
- Application: Sputtering is a process whereby atoms are ejected from a solid target material due to bombardment of the target by energetic particles. The extreme miniaturization of components in the semiconductor and electronics industry requires high purity sputtering targets for thin film deposition.
SAFETY INFORMATION
Pictograms
Signal Word
Danger
Hazard Statements
Precautionary Statements
Hazard Classifications
Carc. 2 - Skin Sens. 1 - STOT RE 1
WGK
WGK 2
Flash Point(F)
Not applicable
Flash Point(C)
Not applicable